Analysis of Photoluminiscence in the NCSI-DMA System

  • Stanislav Jurecka
  • Kentaro Imamura
  • Taketoshi Matsumoto
  • Hikaru Kobayashi
Keywords: semiconductor, silicon nanocrystal, DMA, photoluminiscence

Abstract

Silicon nanocrystalline particles (ncSi) were fabricated from the Si swarf using the beads milling method. Observed photoluminiscence spectra (PL) of the ncSi in hexane with the dimethylanthracene molecules (DMA) show photoluminescence peaks at energies of 2.55, 2.75, 2.92, and 3.09 eV. The shape of PL spectra corresponds to the vibronic structure of adsorbed DMA molecules. The PL intensity of the ncSi-DMA system increases by ~3000 times by adsorption of DMA on Si nanoparticles. The PL enhancement results from an increase in absorption probability of incident light by DMA caused by adsorption on the surface of ncSi. Theoretical model of the PL experiment was constructed and resulting model parameters were used in analysis of possible PL transitions and charge transfer processes.

Author Biographies

Stanislav Jurecka

Institute of Aurel Stodola, University of Zilina, Liptovsky Mikulas, Slovakia

Kentaro Imamura

Institute of Scientific and Industrial Research, Osaka University and CREST, Japan Science and Technology Agency, Ibaraki, Japan

Taketoshi Matsumoto

Institute of Scientific and Industrial Research, Osaka University and CREST, Japan Science and Technology Agency, Ibaraki, Japan

Hikaru Kobayashi

Institute of Scientific and Industrial Research, Osaka University and CREST, Japan Science and Technology Agency, Ibaraki, Japan

Published
2017-09-30
How to Cite
Jurecka, S., Imamura, K., Matsumoto, T., & Kobayashi, H. (2017). Analysis of Photoluminiscence in the NCSI-DMA System. Communications - Scientific Letters of the University of Zilina, 19(3), 21-25. Retrieved from http://journals.uniza.sk/index.php/communications/article/view/228
Section
Articles