Pudis, Dusan, Jarmila Kubicova, Lubos Suslik, Jaroslava Skriniarova, Ivan Martincek, and Ivan Novotny. 2010. “Patterning Techniques for Fabrication of Submicrometer Structures in Photoresist, III-V Semiconductors and PMMA”. Communications - Scientific Letters of the University of Zilina 12 (2), 53-57. http://journals.uniza.sk/index.php/communications/article/view/915.