Harmatha, Ladislav, Peter Valent, and Juraj Racko. “Dielectric Properties and Breakdown of the Gate Oxide in the MOS Structure”. Communications - Scientific letters of the University of Zilina 12, no. 2 (June 30, 2010): 5-9. Accessed April 6, 2026. http://journals.uniza.sk/index.php/communications/article/view/905.